Obtaining the permission of the Rigaku Corporation, I will present the following review article including 10 figures and 28 references:
F. Izumi,"Rietveld Analysis and MEM-Based Whole-Pattern Fitting under Partial Profile Relaxation," Rigaku J., 17, No. 1 (2000) 34-45.
This article describes details in two innovative features implemented in RIETAN-2000: partial profile relaxation and whole-patterning fitting based on the maximum-entropy method. Many equations are included to help you to understand algorithms of the two state-of-the-art techniques.
RIETAN-2000, which enables us to "Refine Different," was released on August 1, 2000. It is distributed free of charge together with its source code, manuals, and templates containing many comments.
Because Rigaku Journal is distributed only outside Japan, I am very pleased that this article can be browsed and distributed freely via the Internet.